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Modeling of temperature and field dependent effective hole mobility at high fields in amorphous selenium

Nour Hijazi、M. Z. Kabir2014-11-01OpenAlex

An analytical model is presented to show the mechanisms of the electric field and temperature dependent effective drift mobility of holes in amorphous selenium (a-Se) considering the density of states distribution, thermally activated tunneling for the field enhancement release rate, and carrier heating. In addition,…

Quantum Dots Synthesis And PropertiesPhase-change materials and chalcogenidesAdvanced Semiconductor Detectors and Materials

Evaluation of Power SiC-MOSFET Using Super-Higher-Order Scanning Nonlinear Dielectric Microscopy—Imaging of Carrier Distribution and Depletion Layer

Norimichi Chinone、Young-Bum Cho、Takashi Nakamura2014-11-01Proceedings - International Symposium for Testing and Failure Analysis

Abstract Evaluation techniques for semiconductor devices are keys for device development with low cost and short time to market. Especially, dopant and depletion layer distribution in devices is a critical electrical property that needs to be evaluated. Super-higher-order nonlinear dielectric microscopy (SHOSNDM) is o…

Semiconductor materials and devicesOptical Coatings and GratingsIntegrated Circuits and Semiconductor Failure Analysis

Copper power pad design challenges for robust and high energy efficient packages

Hoe Jian Chong、Jeramie Dimatira2014-11-01OpenAlex

Current technology trend demands not only for high efficiency but also for portable devices, devices which can be carried and access anywhere and everywhere. This continues drives semiconductor's package towards miniaturization. One way is by placing active circuitry underneath the bond pads, this will reduce the die…

Electronic Packaging and Soldering Technologies3D IC and TSV technologiesCopper Interconnects and Reliability

Fundamental study of air flow effects on liquid removal from wafer surface

Naoyuki HANDA、Kenji Amagai、Akira Fukunaga 等 5 位作者2014-11-01OpenAlex

Effects of air flow on droplet removal from wafer were investigated as the fundamental study of CMP cleaning. Deformation and movement of droplet on wafer by air flow were visualized by a high speed camera, and characteristics of droplet behavior were evaluated. Effects of wafer film types (Two types of wafer, Type-A…

Surface Modification and SuperhydrophobicityAdvanced Surface Polishing TechniquesFluid Dynamics and Thin Films

Degradation behavior of ceria-based abrasives slurry during glass polishing

Koichi Kawahara、Toshimasa Suzuki、Seiichi Suda2014-11-01OpenAlex

Ceria-based abrasives are indispensable for precise polishing of glass substrates. It is of great importance to understand degradation behavior of abrasive slurry for reducing the polishing costs. In this study, we quantitatively investigated the degradation behavior of ceria-based abrasive slurry in glass polishing.…

Advanced machining processes and optimizationDiamond and Carbon-based Materials ResearchAdvanced Surface Polishing Techniques

Study on controlling mechanism of step-terrace structure in CeO2 slurry polishing of 4H-SiC

Hui Deng、Katsuyoshi Endo、Kazuya Yamamura2014-11-01OpenAlex

4H-SiC is considered one of the most promising next-generation semiconductor materials. Therefore, flattening methods of 4H-SiC and their mechanism have been widely studied in recent years. Although the generation of different types of step-terrace structure of 4H-SiC has been widely reported, their generation mechani…

Advanced ceramic materials synthesisDiamond and Carbon-based Materials ResearchAdvanced Surface Polishing Techniques

Title: Next level of productivity through capillary life extension with automatic capillary cleaning

Sivalingam Thevan、Koh Feng Choon2014-11-01OpenAlex

In semiconductor industry, wire bonding is often one of the bottleneck processes. This has posed a tremendous challenge in the wire bond interconnect technology to reduce the assembly cycle time and cost of ownership. Nevertheless, long-life capillary is one of the key factors to the success of advanced wire bonding s…

Surface Modification and SuperhydrophobicityAdditive Manufacturing and 3D Printing Technologies3D IC and TSV technologies

Characteristic of pad cut rate as conditioner structure

Cheolmin Shin、Sunjae Jang、Hongyi Qin 等 5 位作者2014-11-01OpenAlex

The purpose of this paper is to investigate the effect of diamond grit during chemical mechanical polishing (CMP) process. CMP is the most important for planarization of wafer surface in semiconductor manufacturing. During polishing process, the wafer surface and the pad are contacted with the slurry. There are variou…

Advanced machining processes and optimizationDiamond and Carbon-based Materials ResearchAdvanced Surface Polishing Techniques

Obtaining the optimal surface for electronic device deposition using nanotechnologies

Raluca Maria Aileni、Lilioara Surdu2014-11-01OpenAlex

This paper presents several aspects regarding the surface preparation for obtaining wearable devices (sensors embedded in the textile structure). For the electronic devices (OLED, PV, sensors and actuators) deposition it is very important to have a compact woven structure with antistatic, hydrophobic and oleophobic ch…

Surface Modification and SuperhydrophobicityAdvanced Sensor and Energy Harvesting MaterialsNanomaterials and Printing Technologies

Improving and characterizing the quality of (Cd,Zn)Te crystals for detecting gamma radiation

Л. Н. Давыдов、P. Fochuk、A.A. Zakharchenko 等 15 位作者2014-11-01OpenAlex

Cd0.9Zn0.1Te ingots were synthesized from pure components (6N purity Cd, Zn, Te, with In and Fe as dopants) and subsequently grown from the melt under an argon overpressure. Graphite crucibles (with and without an inner coating of pyrolytic BN) were used. The temperature gradient in the solidification zone was ∼15–30…

Radiation Detection and Scintillator TechnologiesNuclear Materials and PropertiesAdvanced Semiconductor Detectors and Materials

Effect of slurry temperature on removal characteristics in cadmium telluride CMP

Byeongcheol Shin、Dasol Lee、Eunjeong Park 等 4 位作者2014-11-01OpenAlex

Cadmium Telluride (CdTe), one of II-VI group compound semiconductors, was used as a material of X-Ray detector, since it has good features of high absorption rate and high conversion efficiency of X-Ray, resulting from its excellent electric properties. However, a rough surface of the CdTe thin-film causes a delay of…

Diamond and Carbon-based Materials ResearchAdvanced Surface Polishing TechniquesIntegrated Circuits and Semiconductor Failure Analysis

Red shift of optical band gap in ZnO doped with K synthesized by solution combustion technique

R. Krithiga、S. Sankar、G. Subhashree2014-11-01OpenAlex

This is a chronicle of the sol-gel auto combustion synthesis of ZnO: K nano grains along with the structural and optical properties. The XRD patterns confirm the substitution of K atoms into ZnO lattice. The grain size, lattice constants and volume are estimated from the XRD patterns. The morphology of the samples are…

ZnO doping and propertiesPerovskite Materials and ApplicationsGas Sensing Nanomaterials and Sensors

Synthesis and analysis of chitosan-lithium battery cell in various charge/discharge currents

Achmad Rochliadi、Multazam、I Made Arcana 等 4 位作者2014-11-01OpenAlex

Electricity is a form of energy that can be easily transformed into other energy forms. The purpose of this study is to analyze the chitosan-lithium battery cells. It is found that the energy of chitosan-lithium battery cells will give decreases with the decreasing of given discharge current at a very small percentage…

Advancements in Battery MaterialsConducting polymers and applicationsAdvanced Battery Technologies Research

Application of Passive Voltage Contrast (PVC) to Dual Beam Focused Ion Beam (FIB) Based Sample Preparation for the Scanning/Transmission Electron Microscope (S/TEM)

Corey Senowitz、Hieu Nguyen、Ruby Vollrath 等 8 位作者2014-11-01Proceedings - International Symposium for Testing and Failure Analysis

Abstract The modern scanning transmission electron microscope (S/TEM) has become a key technology and is heavily utilized in advanced failure analysis (FA) labs. It is well equipped to analyze semiconductor device failures, even for the latest process technology nodes (20nm or less). However, the typical sample prepar…

Advanced Electron Microscopy Techniques and ApplicationsElectron and X-Ray Spectroscopy TechniquesIntegrated Circuits and Semiconductor Failure Analysis

Dielectric properties of Alumina based nanofluids

S. E. Bouzit、H. Ait Dads、S. Tagmouti 等 5 位作者2014-11-01OpenAlex

The alumina (Al2O3) with different morphologies have great interest due to their potential use in various technological areas such as as-catalysis, batteries, solar energy conversion, gas sensing and field emission. In this work, nanostructured Al2O3were prepared by a solution-phase method in the presence of ethylene…

Ferroelectric and Piezoelectric MaterialsSemiconductor materials and devicesHigh voltage insulation and dielectric phenomena

The selection of chemicals in CMP slurry via electrochemical screening

Te‐Yu Wei、Haci Osman Guevenc、Leonardus H. A. Leunissen2014-11-01OpenAlex

Corrosion is an important issue during chemical mechanical polishing (CMP). The surface protection should be considered during CMP and also after CMP post cleaning step. There are several parameters have an impact on corrosion of metal surfaces during CMP such as chelating agent (AC), corrosion inhibitor (I) and pH. E…

Corrosion Behavior and InhibitionAdvanced Surface Polishing TechniquesAdvanced Machining and Optimization Techniques

CMP process development for Cobalt liner integration at the 28-nm-node

Johannes Koch、Sascha Bott、Marcus Wislicenus 等 9 位作者2014-11-01OpenAlex

Advanced liner materials are crucial for optimizing and further shrinking of integrated circuits' interconnects. For next generation devices there is a focus on Cobalt (Co) and Ruthenium (Ru) [1]. Besides the challenges to deposit such materials, new chemical-mechanical polishing (CMP) process compatibility is needed.…

Semiconductor materials and devicesCopper Interconnects and ReliabilityIntegrated Circuits and Semiconductor Failure Analysis

Applications of AFP Nanoprobing for Localization of Implant Related Issues

N. Dayanand、K.H. Yip、A.C.T. Quah 等 8 位作者2014-11-01Proceedings - International Symposium for Testing and Failure Analysis

Abstract The case study in this paper describes how collaboration between customer design and test teams and a thorough FAB investigation triggered by a detailed electrical analysis using the Atomic Force Nanoprober (AFP) resulted in the effective resolution of a challenging implant related issue on LDMOS structure th…

Semiconductor materials and devicesElectron and X-Ray Spectroscopy TechniquesIntegrated Circuits and Semiconductor Failure Analysis

The study of electromagnetic field inside a multiloop antenna

Pantis Dan、Borda Monica2014-11-01OpenAlex

The aim of the paper is to characterize the distribution of the electromagnetic field inside and near the solenoid multiturn antenna, respecting the requirements of Ion Chiricuta Oncological Institute laboratory. We will also measure the antenna parameters. Also, we will present some practical results from the common…

Carbon Nanotubes in CompositesElectromagnetic Fields and Biological EffectsRadiation Therapy and Dosimetry

Investigation of gas pressure on metallic particle contaminationin 1-Ø gas insulated busduct

P. Nagarjuna Reddy、J. Amarnath、N. RamaRao2014-11-01OpenAlex

SF6 gas has been adopted asan alternative of air for insulation technology in modern day industry due to its high dielectric strength and arc quenching properties. In the recent past, electrical substations are employing gas insulation because of its better properties and also lower space requirement. One of the major…

High voltage insulation and dielectric phenomenaPower Transformer Diagnostics and InsulationThermal Analysis in Power Transmission