Materials Literature
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A series of bidentate nitrogen-sulfur pro-ligands has been designed and synthesized with the purpose of introducing a structural modification that favours the tetrahedral site distortions of metalloprotein systems with metallic centers surrounded by ligands containing two N atoms and two S atoms as donor groups. Some…
In semiconductor manufacturing, control of hotspots by optical proximity correction (OPC) requires accurate measurements of shapes and sizes of fabricated features. These measurements are carried out using CD-SEM. In order to measure 2D shapes, edges of features should be clearly defined in all directions. Positions o…
The crystal structure of the R(2)SnS(5) (R = Pr, Nd, Gd and Tb) compounds has been investigated using X-ray single-crystal diffraction. Crystal architecture and structural relationships among U(3)S(5), Y(2)HfS(5), R(2)SnS(5) compounds are discussed and a structural origin is determined. It is shown that the complex ar…
The closed-form dispersion equation for surface polaritons localized near the planar interface of the semi-infinite halves of the same transparent uniaxial dielectric gyrotropic medium was derived for the case when the gyration vectors of the contacting materials are perpendicular to the interface and oppositely direc…
The necessity for and validity of the bias-free line-edge roughness (LER) evaluation are examined. In a typical case, the LER obtained by the conventional method is found to contain 10% or more bias caused by noise. That is, the biasfree LER evaluation is needed to achieve absolute measurements. The bias-free method i…
A quantitative physical model has been expressed in terms of features generic to electrical ageing.This has been used to simulate the evolution of damage structures during the electrical ageing of insulating polymers.During the main part of the ageing process isolated regions of damage were produced at a few extremely…
The beta-2 crystal structures of a series of saturated and trans-mono-unsaturated triacylglycerols (TAGs) have been solved from high-resolution powder synchrotron diffraction data. The series comprises symmetric as well as asymmetric even-numbered TAGs and the trans-mono-unsaturated ones all have a single elaidoyl cha…
The incommensurately modulated scheelite-like KSm(MoO(4))(2) structure has been refined in the monoclinic superspace group I2/b(alphabeta0)00 by the Rietveld method on the basis of synchrotron radiation powder diffraction data. The systematic broadening of satellite reflections has been accounted for by applying aniso…
The well known 36 distinguishable transformations between adjacent kaolin layers are split into 20 energetically distinguishable transformations (EDT) and 16 enantiomorphic transformations, hereafter denoted EDT*. For infinitesimal energy contribution of interactions between non-adjacent layers, the lowest-energy mode…
Spectroscopic Mueller polarimetry may provide a useful alternative to standard spectroscopic ellipsometry (SE) for the dimensional characterization of periodic structures, as it provides 16 quantities instead of 2 for SE. We present a detailed experimental comparison of the results provided by conventional scatteromet…
Utilizing self-assembly to create supramolecular structures is an active area at this time. Hybrid materials created by blending or doping, e.g., organic/inorganic or donor/acceptor complexes are of great interest in the design of novel materials systems. The effect of mixing of any two self-assembling molecules to mo…
A simplified and novel kinetic model was first developed by way of characterization of Fourier transform infrared spectroscopy, scanning electron microscopy, and the weight-loss method for PMMA decomposition under a microwave assisted digestion system. By Newton's method, the experimental results of the remaining weig…
For hydrophilic organic solids, it is well recognized that degradation is often promoted by exposure to humid conditions. Although this is an important issue for certain classes of materials, in particular pharmaceuticals, the factors which dictate the sensitivity of a given compound to moisture are not well understoo…
In the present study, the Zn x Mn 1 - x Fe 2 O 4 series of ferrites, where x = 0.1, 0.3, 0.5, 0.7 and 0.9, are prepared by the citrate precursor technique. One set of samples is subjected to the normal pressing technique and the other to the hot-pressing technique. X-ray diffraction (XRD) and scanning electron microsc…
There has been a substantial increase in the research and development of optical metrology techniques as applied to linewidth and overlay metrology for semiconductor manufacturing. Much of this activity has been in advancing scatterometry applications for metrology. In recent years we have been developing a related te…
Superelasticity, a unique property of shape memory alloys (SMAs), allows the material to recover after withstanding large deformations. This recovery takes place without any residual strains, while dissipating a considerable amount of energy. This property makes SMAs particularly suitable for applications in vibration…
The overlay metrology budget is typically 1/10 of the overlay control budget resulting in overlay metrology total measurement uncertainty requirements of 0.57 nm for the most challenging use cases of the 32nm technology generation. Theoretical considerations show that overlay technology based on differential signal sc…
Porous semiconductor compound nanoparticles have been prepared by a new technique utilizing electronic excitation. The porous structures are formed in GaSb particles, when vacancies are efficiently introduced by electronic excitation and the particle size is large enough to confine the vacancy clusters. The capture cr…
Electron beam-induced contamination is one of the most bothersome problems encountered in the use of the scanning electron microscope (SEM). Even in "clean-vacuum" instruments it is possible that the image gradually darkens because a polymerized hydrocarbon layer with low secondary electron yield is deposited. This co…
Resolution enhancement in advanced optical lithography will reach a new plateau of complexity at the 32 nm design rule manufacturing node. In order to circumvent the fundamental optical resolution limitations, ultra low k<sub>1</sub> printing processes are being adopted, which typically involve multiple exposure steps…