Materials Literature
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Fresh tomatoes Italian variety were subjected to surface disinfection processes using calcium hypochlorite solutions to determine their germicidal efficiency and kinetics that governs the surface inactivation process in aerobic mesophilic bacteria, yeasts and molds. Chlorine as surface disinfectant was effective again…
In this paper, we report the development of new xanthendiol derivatives applied to the negative-tone molecular resists for EB/EUVL. The new xanthendiol derivatives were easily synthesized by the condensation of aldehydes and dihydroxyaromatic compounds. We found 13-biphenyl-13H-benzoxanthen-3,10-diol was showed the go…
In this paper, we report a double patterning process resulting in amorphous silicon (a-Si) gate lines with a thickness of 80nm and a lateral critical dimension (CD) below 30nm. We present a full stack for a double patterning approach for etch transfer down to a Si layer, including a hard mask in which the line and cut…
Directed self-assembly (DSA) of block copolymers is proving to be an interesting and innovative method to make three-dimensional periodic, uniform patterns useful in a variety of microelectronics applications. Attributes critical to acceptable DSA performance of block copolymers include molecular weight uniformity, fi…
Current photoresist materials are facing many challenges introduced by advanced lithographies, particularly the need for excellent compositional homogeneity and ultrathin film thickness. Traditional spin-on polymeric resists have inherent limitations in achieving a high level of control over the chemical composition,…
This paper presents a single degree of freedom model for the nonlinear vibration of a metal-matrix composite manufactured by ultrasonic additive manufacturing that contains seamlessly embedded magnetostrictive Galfenol alloys (FeGa). The model is valid under arbitrary stress and magnetic field. Changes in the composit…
The different exposure sources induce a different energy deposition in resist materials. Linear energy transfer (LET) effect for resist sensitivity is very important issue from the viewpoint of radiation induced chemical reactions for high-volume nanofabrication. The sensitivities of positive tone non-chemically (non-…
Quantum dots (QDs) of semiconductors are promising materials for light emission applications due to their size-tunable optoelectronic properties. We present results of direct quantum dot (QD) formation from precursors inside a polymer matrix using laser irradiation. The method is important because it provides a simple…
The dynamics of hyperthermal O((3)P) reactions with acetylene have been investigated with the use of crossed molecular beams techniques, employing both mass spectrometric and optical detection of products. With collision energies of 40-150 kcal mol(-1), O((3)P) + HCCH/DCCD → HCCO/DCCO + H/D may follow multiple pathway…
EUV lithography is one of the most promising techniques for the advanced patterning, however it is well known that EUVL solutions still face significant challenges. Therefore we have focused on 193 based self-aligned multiple patterning, because SAMP(SADP to SAQP) easily enables fine periodical patterning. As you know…
A new type of plasma source (RLSATM) is described to generate low temperature plasma in the wafer region. The low Te characteristic arises from decoupling of wafer region palsma from the power deposition region. This new plasma source has been demonstrated to show improved performance in etching high aspect ratio stru…
Double Patterning process is one of the most promising lithography techniques for sub-40nm half-pitch technology node. Especially, Self-aligned spacer Double Patterning (SADP) has been adopted in HVM of NAND FLASH memory device[1], and it is expanding to employ in DRAM and logic device. If EUVL should not be ready on…
The negatively-charged nitrogen-vacancy centers in diamond has motivated many groups building scalable quantum information processors based on diamond photonics. This is owning to the long-lived electronic spin coherence and the capability for spin manipulation and readout of NV centers.1-4 The primitive operation is…
Solving the issue of line edge/width roughness (LER/LWR) in chip manufacturing is becoming increasingly urgent as the feature size continues to decrease. Several post-lithography processing techniques have been investigated by the semiconductor industry, but they were often proved to be inadequate in one area or anoth…
The novel Line-start Permanent Magnet Synchronous Motor (LSPMSM) has widely industrial applications, due to its high efficiency, high power factor and self-starting ability. The starting characteristics of novel LSPMSM with rotor arc straight inserted permanent magnet are studied based on the electromagnetic field the…
In this paper, we present a cut-process overlay yield model for self-aligned multiple patterning and study how its yield will be affected by the overlay errors and cut-hole overhang. A geometric model is developed to identify the yield-related structures and construct the probability-of-failure (POF) functions. A gene…
A new approach has been introduced for separation of oil-in-water emulsion by using ultrasound standing wavefield. A neural networks model was used to simulate changes in the size of droplet during treatment. Model outputs were then validated and generalization capability was evaluated. For each network, the optimum v…
In this presentation, we describe multi-scale modeling method combining PROLITH lithography simulation with Self-Consistent Field Theory (SCFT) computation of the block copolymer Directed Self-Assembly (DSA). Within this method, we utilize PROLITH to predict the shape of a lithographic feature as function of process c…
Doping behavior in quantum dots (QDs) differs from that in the bulk. Despite many efforts, the doping properties are still not fully understood. Using first-principles methods, we have calculated the formation energies of various group-III acceptors and group-V donors doping at all nonequivalent sites in a Si QD (Si${…
The semiconductor industry is facing serious challenges in LWR control at the node of 16nm feature size. One of the reasons that causes LWR is the acid diffusion during post-exposure bake of chemically amplified resists. Laser spike annealing was introduced as a post-exposure bake (PEB) step in order to solve the imag…