Materials Literature
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The development of next-generation lithography (NGL) such as EUV, NIL and maskless lithography (ML2) are driven by the half pitch reduction and increasing integration density of integrated circuits down to the 22nm node and beyond. For electron beam direct write (EBDW) several revolutionary pixel based concepts have b…
Abstract The reaction of a mixture of barium and rhenium (3:1) at 850 °C under flowing nitrogen yielded the nitride‐oxide (Ba6O)(ReN3)2 (R$\bar{3}$ (No. 148); a = 8.1178(2) Å, c = 17.5651(4) Å; V = 1002.43(5) Å3; Z = 6). According to a structure refinement on X‐ray powder diffraction data, this compound is isostructur…
Thin film hardmasks with 10nm or less are used in double patterning techniques to generate fine patterns for 32nm-node and beyond. Using a conventional Mask CDSEM for ultra accurate measurement of patterns on these thin film hardmasks is difficult due to weakness of the edge profiles generated by a scanning electron b…
Photomask lithography for the 22nm technology node and beyond requires new approaches in equipment as well as mask design. Multi Shaped Beam technology (MSB) for photomask patterning using a matrix of small beamlets instead of just one shaped beam, is a very effective and evolutionary enhancement of the well establish…
The mask industry has recently witnessed an increasing number of new MoSi mask blank materials which are quickly replacing the older materials as the standard in high end mask shops. These new materials, including OMOG (opaque MoSi on glass) and high transmission (Hi-T) films, are driven foremost by the need to reduce…
The probability and dimension of the simple macromolecular knots over a wide range of temperatures corresponding from good to poor solvents are investigated by Monte Carlo simulation. Macromolecular knots are modeled as rings of self-avoiding walks on a simple cubic lattice with the nearest neighbor attractions. We fo…
A series of carboxylate-bridged heteronuclear 3d–4f complexes have been prepared by reaction of REL3 (HL = CH2 = C(CH3)COOH) with Cu(NO3)2. A family of air-stable 2-D complexes [RECuL4(H2O)4] n L n (RE = La (1), Ce (2), Eu (3), and Gd (4)) have the same crystal system (monoclinic) and space group (P21/c). The chains w…
Reduction of [Cp* 2 Ir 2 (μ-CH 2 ) 2 Cl 2 ] (Cp* = η 5 -C 5 Me 5 ) with Na in benzene leads to the formation of a methylene-bridged iridium(I) dinuclear complex with a considerably short Ir−Ir double bond (2.4375(2) Å), [Cp* 2 Ir 2 (μ-CH 2 ) 2 ], which reacts with alcohols (RCH 2 OH, R = H, Me, Et, Ph) to afford a uni…
El trabajo aquí desarrollado pretende ofrecer una nueva perspectiva para el estudio de los retablos Barrocos portugueses, incidiendo en la caracterización elemental del oro utilizado para el dorado y en la identificación de elementos característicos de su composición. En este sentido fueron analizados los retablos may…
To make an exact research into the performance of conventional MOS-like carbon nanotube field-effect transistors (C-CNFETs) with realistic contacts, we studied the effect of Schottky contacts on the performance of C-CNFETs following a detailed analysis of contacting circumstances of C-CNFETs in circuit applications. A…
Thickness measurements of thin films having thickness less than 1 µm are difficult to obtain by an interferometer. These difficulties arise from the overlap of the fringes from the upper and lower surfaces of the thin films. This paper presents a new methodology that mediates the consequences of this overlap and then…
In this study, single and multi‐objective models have been developed aiming to optimize the cost and/or one or more defined performance properties of towel fabrics. For this purpose, the developed mathematical equations based on the physical and performance properties of a towel have been used as objective function an…
The adaption of EUVL requires the development of new cleaning method for the removal of new contaminant without surface damage. One of the harsh contaminants is the carbon contamination generated during EUV exposure. This highly dense organic contaminant is hardly removed by conventional SPM solution on Ru capped Mo/S…
To our knowledge, this is the first study to examine the relationship between guanine nucleotide binding protein β-1 (GNB1) mRNA expression and clinicopathological parameters. Furthermore, the correlations between GNB1, Rictor and the mammalian target of rapamycin (mTOR) were also investigated. Materials and Methods:…
Bit patterned media (BPM) is one of the promising technologies for ultra-high density storage in future hard disk drives. However, there are many challenges in fabricating BPM. In particular, applications with area density much greater than 1 Tbit/in2 require magnetic bits to be at sub-10 nm dimensions. Etching at the…
Abstract Graphite oxide (GO) has received extensive interest as a precursor for the bulk production of graphene‐based materials. Here, the highly energetic nature of GO, noted from the self‐propagating thermal deoxygenating reaction observed in solid state, is explored. Although the resulting graphene product is quite…
This paper reports the template-induced formation of molecular corrals on the Si(111) surface by taking the advantage of the intrinsic property of the reconstructed (7 × 7) unit cell. Self-assembled molecular corrals have been formed on the Si(111)-(7 × 7) surface by binding pyrrole molecules chemically on the silicon…
Magnetic hysteresis curves were simulated by the Monte Carlo method to study magnetic property changes under the sensitization of Ni base alloy, Alloy 600 (Inconel), which is well used as structural materials in nuclear power plants. Different distributions of spin concentration depending on heating duration time in c…
The Proximity Effect is a critical problem in EB Lithography which is used in Photomask writing. Proximity Effect means that an electron shot by gun scatters by collided with resist molecule or substrate atom causes CD variation depending on pattern density [1]. Scattering by collision with resist molecule is called a…
We previously discovered N-substituted formamide deformylase (NfdA) in Arthrobacter pascens F164, which degrades N-substituted formamide (Fukatsu, H., Hashimoto, Y., Goda, M., Higashibata, H., and Kobayashi, M. (2004) Proc. Natl. Acad. Sci. U.S.A. 101, 13726-13731). In this study, we found an enzyme involved in the fi…