Materials Literature
按标题、摘要、年份、主题和来源检索公开元数据。结果保留作者、摘要、分类与原始来源链接。
Atomic-scale stages of the growth of an interfacial precipitate film of tetragonal molybdenum carbide at a $\ensuremath{\Sigma}5$ (310) [001] symmetrical tilt grain boundary in body-centered cubic molybdenum were investigated by means of atomistic supercell calculations on the basis of ab initio density functional the…
The ASML extreme ultraviolet lithography (EUV) alpha demo tool is a 0.25NA fully functional lithography tool with a field size of 26×33 mm2, enabling process development for sub-40-nm technology. Two exposure tools are installed at customer facilities, and are equipped with a Sn discharge source. In this paper we pres…
The ${\mathrm{Cs}}_{6}{\mathrm{C}}_{60}$ molecular crystal has been studied by Raman spectroscopy measurements and ab initio calculations under high pressure. The Raman scattering data have been collected from ambient pressure up to $45.5\phantom{\rule{0.3em}{0ex}}\mathrm{GPa}$ at room temperature. It is shown that th…
For many years, lithographic resolution has been the main obstacle for keeping the pace of transistor densification to meet Moore's Law. For the 45 nm node and beyond, new lithography techniques are being considered, including immersion ArF lithography (iArF) and extreme ultraviolet (EUV) lithography. As in the past,…
This paper describes our initial investigation into building a greater understanding of the complex mechanism occurring during extreme ultraviolet (EUV) exposure of resist materials. In particular, we are focusing on the number and energy of photoelectrons generated and available for reaction with photoacid generators…
An ionic and non-ionic single molecule chemically amplified resist have been synthesized, characterized, and imaged under high resolution e-beam. The ionic single molecule resist is based on a tBoc protected triarylsulfonium (TAS) core that generates a free superacid upon exposure. TAS demonstrates a low LER (3&sgr;)…
The beta'(1)-2 crystal structures of a series of mixed-chain saturated and trans-mono-unsaturated triacylglycerols containing palmitoyl, stearoyl and elaidoyl acyl chains have been solved from high-resolution powder diffraction data, from synchrotron as well as laboratory X-ray sources. The structures crystallized in…
We apply the polar decomposition of the Mueller matrix describing a liquid-crystal-on-silicon display to identify the diattenuator, depolarizer, and retarder contributions as a function of the gray level. The retarder contribution is expressed in terms of the equivalent Jones matrix to apply previous techniques to eva…
We studied the steady state behavior and magnetization switching process of single domain particles subject to ac and dc magnetic fields using analytical and numerical models based on the Landau–Lifshitz–Gilbert equation. We compared the analytical solutions for circularly polarized fields with a numerical single spin…
The aim of the paper is the development of an all-dry photolithographic process in which the film preparation step as well as the development step is performed without the use of solvent. To implement an all-dry photoresist system we focused on coumarin derivatives, as this class can be photodimerized in the solid sta…
Bipolar plates are one of the most important components in PEM fuel cell stacks. Currently, the commercial bipolar plates are made of non-porous graphite because of its chemical and thermal stability. However, they account for about 80% of the total weight and 45% of stack cost. In this study, commercial grade 2 titan…
EUV lithography is the leading candidate for sub-32nm half-pitch device manufacturing. This paper deals with the investigation of the impact of the mask blank architecture on the wafer print by EUV lithography. Presently the material stack on the mask is not fixed and different suppliers offer a range of variation. Th…
One of the remaining challenges for the commercialization of EUV lithography is the lifetime of the Mo/Si multilayer optics and masks. The lifetime is dominated by carbon contamination on the surfaces of the optics, which is caused by residual hydrocarbons in the vacuum chamber when optics are exposed to EUV radiation…
BACKGROUND: Despite the use of currently optimized lipofection conditions, including transfection in serum-depleted media, the efficiency of gene transfer is low and high transfection rates often induce cytotoxicity. A lipid formulation with transfection efficiency not inhibited by serum would provide an advance towar…
Base titration methods are used to determine C-parameters for three industrial EUV photoresist platforms (EUV- 2D, MET-2D, XP5496) and twenty academic EUV photoresist platforms. X-ray reflectometry is used to measure the density of these resists, and leads to the determination of absorbance and film quantum yields (FQ…
Abstract Three couples of reversible redox peaks of the PW12O403− (PW12) anion, which are composed of two one‐electron and one two‐electron processes occur in the potential range from +0.25 to −0.7 V in aqueous solutions. The electrocatalytic reduction of nitrite has been studied by the first redox couple of the PW12…
Motivated by the synthesis of the first entirely inorganic metallocene sandwich ion [eta(5)-Ti-(P(5))(2)](2-) [E. Urnezius et al. Science 295, 832 (2002)], we have designed a new inorganic metallocene sandwich [eta(6)-V-(P(6))(2)] and multidecker sandwich clusters up to V(4)(P(6))(5) by employing an all electron gradi…
We have measured the acid generation efficiency with EUV exposure of a PAG in different polymer matrixes representing the main classes of resist polymers as well as some previously described fluoropolymers for lithographic applications. The polymer matrix was found to have a significant effect on the acid generation e…
We present a new optical technique for dimensional analysis of sub 100 nm sized targets by analyzing through-focus images obtained using a conventional bright-field optical microscope. We present a method to create through-focus image maps (TFIM) using optical images, which we believe unique for a given target. Based…
The lifetime of Mo/Si multilayer-coated projection optics is one of the outstanding issues on the road of commercialization of extreme-ultraviolet lithography (EUVL). The application of Mo/Si multilayer optics in EUVL requires both sufficient radiation stability and also the highest possible normal-incidence reflectiv…